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It was also named after Semiconductor, Photomask, IC, integrated-circuits, integrated-circuit-fabrication, silicon, wafer, SPIE, SEMATECH, mask-industry, mask-inspection, nanochannel-glass, SMIF-interface, laser-mask-writer, VPG, VLSI, phase-shifting, altering-aperture-phase-shifting, immersion-lithography, hyper-NA, EUV, MEFF, scattering, pellicle, thin-film, nitrocellulose, silver-halide, soda-glass, borosilicate, quartz, chromium, plotter, master-plate, fused-silica-plate, stepper, scanner, multi-patterning, photoreticle, photomask, photolithography, rubylith, mylar, mask-set, optical-pattern-generator, step-and-repeat-camera, mutiple-IC-mask, reticles, electron-beam-lithography, laser-lithography, contact-aligner, and photoresist.